Used KLA / ICOS CI 9450 #9397172 for sale

KLA / ICOS CI 9450 Mask and Wafer Inspection equipment is an automated inspection system that performs automated visual inspection of both masks and wafers. It is capable of accurately and rapidly detecting and analyzing features on both masks and wafers to quickly identify any defects. KLA CI 9450 is equipped with four digital camera heads that can be used to acquire images of both masks and wafers. These camera heads are able to acquire high-resolution images of the masks and wafers with pixel sizes as small as four microns. The unit is further equipped with an Array Close Proximity Raster Inspection (ACRx) optical head, which provides high-precision, high-speed imaging and analysis capabilities. ICOS CI-9450 utilizes an advanced next-generation Field Programmable Gate Array (FPGA) technology to enable efficient and high-precision image acquisition and analysis. The machine is also capable of multi-view imaging and has an advanced alignment tool that ensures accurate imaging and alignment between the wafer and mask. It is further capable of automatic focus and automatic defect detection. CI 9450 is designed to automatically detect and classify the defects on both the mask and wafer. It has two process control algorithms, the first is the EAL (Equal Area Logic) algorithm, which is designed to compare the scanned image to a golden reference image. The second is the Statistical Probability algorithm, which uses statistical data such as feature size and type to identify any defects. In addition, KLA CI-9450 is capable of rapid image acquisition and high-speed image analysis. It also has an auto-learn technology, which is capable of adapting to a wide range of applications and can be used to improve the asset's defect detection and classification accuracy. Overall, KLA / ICOS CI-9450 Mask and Wafer Inspection model is a highly advanced inspection equipment that is capable of accurately and rapidly detecting and analyzing features on both masks and wafers. It is equipped with the latest in imaging and inspection technology and provides an efficient and accurate solution for inspection of masks and wafers.