Used KLA / ICOS CI-T120 #293649669 for sale
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ID: 293649669
Lead scanner
2D/3D Lead and ball and padscan:
2D: IVC2000
3D: IVC2000
2D/3D FOV: 42.5 x 42.5
Tape and real:
Heating sealing module, 16 mm
Sealing knife change kit, 12 mm, 24 mm, 32 mm
Top 2D marking inspection:
Marking inspection: IVC2000
FOV: 42.5 x 42.5.
KLA / ICOS CI-T120 is a state-of-the-art mask and wafer inspection equipment for microelectronics manufacturing applications. Designed for automated inspection and metrology of mask and wafer features, KLA CI T120 delivers superior image clarity, flexible configurations, and high throughput. The powerful image acquisition system provides high-resolution imaging capabilities, allowing minute details to be seen with unparalleled accuracy. The wafer stage unit allows for high precision movement of wafers within the field of view, and the advanced lighting allows for excellent surface reflection and light intensity control. The machine's versatile analysis routines can identify user-defined defects, evaluate surface topography, or measure overlay. A comprehensive library of measurement and analysis routines are available, as well as options for customized measurements and analysis. The tool is capable of measuring critical dimensions, such as line width and pattern repeatability, to industry accuracy standards (Class 0.5). It also supports measurements such as defect area and line end shortening. Theuser control and analysis asset provides a simple and easy-to-use interface, allowing users to quickly access model functions. The software is designed to provide maximum flexibility, allowing users to tailor equipment performance to their exact requirements. In addition to its excellent performance, ICOS CI T-120 is designed to provide maximum uptime, making it an excellent choice for high-volume production lines. System maintenance is simplified, due to its modular design, allowing replacement of individual components, should they fail. In conclusion, CI-T120 is an advanced and powerful mask and wafer inspection unit, designed to provide superior image clarity, high throughput, and maximum reliable uptime. Its flexibility and versatility allows for custom analysis routines, and its user-friendly control and analysis machine makes it easy to configure and optimize.
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