Used KLA / ICOS CI-T120 #293662323 for sale

KLA / ICOS CI-T120 is a mask and wafer inspection equipment. It is used by the semiconductor industry to inspect photomasks and wAFERS for defects, scratches, contamination and other optical irregularities. KLA CI T120 is a high-end inspection system, combining advanced optics, software, and camera technology to deliver industry leading precision and accuracy in detecting and correcting defects. At the heart of ICOS CI T-120 is a high-resolution, two-dimensional camera capable of capturing images with a resolution as small as 10 microns or less for photomask and wafer inspection. The unit is configured with a set of inspection lenses, depending on the application. These lenses include achromatic, multi-field, special purpose and deflectable lenses for inspecting photomasks and wAFERS. CI T-120 also incorporates various pieces of software for defect detection and correction. This includes software for reducing pattern distortion, for enhancing pattern recognition, and for detecting contaminants and scratches. KLA CI-T120 is optimized for use in automated inspection stations. It is equipped with robotic arm interface capability allowing the inspection machine to be connected to different robotic arms for automating the mask and wafer inspection process. It further features multi-zone-imaging and stitching for aligning images across different zones, or for automated binning of masks and wafers. On the user interface side, ICOS CI-T120 delivers a comprehensive GUI tool for controlling and monitoring the inspection process. The GUI allows for setting measurement parameters, monitoring inspection results, and observing the overall integrity of the inspection task. Also included is a powerful management asset which enables users to configure and monitor the inspection model performance, as well as generate reports on the inspection results. In conclusion, KLA / ICOS CI T-120 is a powerful tool for the semiconductor industry for performing mask and wafer inspections. It is designed to deliver state-of-the-art performance, through its advanced optics and software capabilities. CI-T120 delivers high-end accuracy and precision for detecting and correcting defects in photomasks and wAFERS. Its integration with a robotic arm ensures efficient automation of the inspection process, while its comprehensive GUI and management equipment enables users to efficiently control and monitor the entire process.