Used KLA / ICOS CI-T120 #293792882 for sale

KLA / ICOS CI-T120 is a high-performance mask and wafer inspection equipment designed for the fab environment. Incorporating advanced optics, laser, and imaging technologies, KLA CI T120 is engineered with data-driven intelligence for precise detection of both on-mask and on-wafer defects. Its advanced illuminated Laser Interferometry System (LIS) enables non-destructive, high-resolution imaging of surface topographies (TES) for accurate defect detection and classification. ICOS CI T-120 has an enhanced array of filters and lenses enabling ultra-fast illumination of line-by-line or matrix area inspection of areas upwards of 8,400 millimeters squared (mm2). KLA CI-T120 also contains a powerful image processing engine for comprehensive image analysis. Its built-in library of data-driven artificial intelligence algorithms can detect micro-defects and classify them into distinct size, intensity, and topological groups. Additionally, CI T-120 is equipped with a highly sensitive Inspection Pattern Recognition (IPR) algorithm to detect all types of bridge defects and semi-bridge defects. The IPR algorithm is capable of recognizing and measuring even the smallest defects - down to 50 nanometers (nm) - by recognizing and isolating defect features such as broken or missing bridges, deflects, and mesh faults. ICOS CI T120 is designed to streamline mask and wafer inspection processes. The turnkey unit makes setup and calibration fast and easy, while its automated software enables swift data collection and imaging. It also enables full-wafer inspection of large wafers at a speed of up to 3.3 wafers per hour. Additionally, its internal monitoring systems help to reduce equipment downtime by providing real-time performance feedback and diagnostics. CI-T120 meets or exceeds both U.S. and international standards for reliable defect detection, as well as requirements for low-particle risk. In addition, this machine helps to reduce the need for costly post-processing steps, as its superior defect detections help ensure that the highest-quality wafers and masks meet fabrication requirements. Furthermore, the tool provides comprehensive statistical and quality process control data for easy analysis and reporting. CI T120 is an excellent choice for semiconductor and photomask manufacturing operations requiring reliable and cost-effective inspection solutions. With its combination of advanced optics, imaging, and artificial intelligence technologies, KLA CI T-120 is an ideal solution for achieving superior quality control.