Used KLA / ICOS CI-T120 #9190203 for sale

KLA / ICOS CI-T120 is a high-speed, dual-beam, optical inspection equipment, which is used for inspecting semiconductor wafers and masks. It is a cost-effective solution for identifying defects on semiconductor wafers during front-end and back-end processes of integrated circuit manufacturing. KLA CI T120 is capable of detecting very small defects such as particle defects, scratches, voids, and non-conformances on wafers and masks. The system uses two synchronized scanning microscopes to examine wafers and masks by combining brightfield lighting, transmitted light imaging, and darkfield brightfield imaging. The brightfield lighting easily detects particle defects while the transmitted light imaging technology identifies sub-micron defects including voids. The darkfield brightfield imaging yields high contrast and high resolution images for optimal defect characterization. ICOS CI T-120 includes an advanced automatic signal processing capability with programmable defect detection thresholds. This enables the unit to automatically detect defects and minimize false alarms. ICOS CI T120 has a maximum field size of 3 inches (7.62 cm) and provides a data acquisition rate of up to 1.3 megapixels/sec. It also features 8-bit and 12-bit pixel bit depths, which enable the machine to accurately capture and analyze even the smallest defects. It is compatible with a variety of media including CDs, DVDs, tapes, and hard disks. The tool is equipped with a simple and intuitive user-friendly graphical interface, which helps operators inspect wafers and masks quickly and efficiently. The asset can be integrated with an existing semiconductor manufacturing model, allowing easy implementation and integration. It also includes an array of software options to ensure that it can be customized and configured to meet the specific requirements of each customer. Overall, KLA CI-T120 is a powerful inspection equipment designed to provide high-precision, cost-effective defect assessment and analysis for semiconductor wafers and masks. Its dual-beam optics, programmable defect detection capabilities, and high acquisition rate ensure that it can accurately identify even the smallest defects. Its user friendly interface, compatibility with various media, and integration capability make it an ideal choice for semiconductor manufacturers.