Used KLA / ICOS CI-T120 #9195098 for sale

KLA / ICOS CI-T120 is a top-of-the-line mask and wafer inspection equipment designed to provide highly accurate and reliable defect inspection capabilities for device fabrication. The system features advanced optical imaging capabilities that allow for high-resolution inspection of samples at multiple levels. The imaging unit is composed of a high-quality CCD camera with precision optics for sample inspection. Advanced lighting and image capture technology can be used to detect and measure even the smallest defects. Additionally, the machine features a built-in microscope to view areas at a higher magnification if needed. The tool features an intuitive user interface with tools to quickly and accurately analyze data. A scan search feature can quickly identify non-uniformities such as particles, defects, and contaminants. Additionally, the asset data can be stored in multiple formats allowing for efficient archival and retrieval. The model also utilizes rapid scan times and wide-area coverage, allowing for quick and accurate defect detection of multiple wafers at once. The equipment uses integration algorithms to provide high-fidelity images and accurate analysis of scan data. Additionally, the system utilizes multiple inspection algorithms to address specific needs, such as mask flatness, mask registration, and more. KLA CI T120 is suited for extracting defect information of critical masks and wafers and provides a reliable unit for quality control. Its data capture capabilities allow for extensive analysis of scan data with multiple inspection algorithms for a wide range of test scenarios. The intuitive user interface allows for quick navigation and analysis of inspection results, ensuring accurate and reliable operation. The machine's high-fidelity imaging capabilities and intuitive user interface make it an ideal tool for production quality control.