Used KLA / ICOS CI-T120 #9221136 for sale

KLA / ICOS CI-T120 is a mask & wafer inspection equipment designed to detect defects in the various layers of reticle and wafer material. The system has an ultra-high resolution to ensure a clear and accurate inspection of the materials. It provides enhanced visualization of 3D topography, reflection, transmission, and fluorescent images on both reticles and wafers. The unit includes an advanced suite of image-processing tools for distinguishing potential defects from regular patterns or features. It uses a variety of lighting systems and microscopes—including a laser beam writer and optical microscope—to capture a large number of images with precise spatial resolution, as well as to record their intensities. This enables accurate comparison and analysis of different images (e.g., pictures at different magnifications). KLA CI T120 also features integrated and automated defect inspection and review capabilities, allowing the user to easily inspect and measure multiple defects on a given wafer. The machine is able to identify the most commonly occurring types of defects, including particles, lines, blisters, etc. It can also detect slight variations in surface morphology and layers. ICOS CI T-120 can operate at speeds up to 200 wafers per hour, greatly reducing the inspection time for comparison against the process window. Moreover, CI-T120 comes with a comprehensive suite of reporting and data analysis tools. User-configurable reports enable the user to quickly identify problem areas and improve the quality of their process. The tool offers real time control and display of various parameters to better observe process deviations. KLA CI T-120 is thus an invaluable tool for wafer and mask manufacturing, enabling manufacturers to quickly detect and address defects in the production process. It helps reduce the costs of uninspected or reworked masks and wafers, and helps reduce lost production time. Additionally, the asset's high throughput, resolution, and automated defect detection capabilities make it one of the best automatic mask and wafer inspection systems available today.