Used KLA / ICOS CI-T120 #9232196 for sale

KLA / ICOS CI-T120 is a next-generation mask and wafer inspection equipment that offers advanced capabilities for non-destructive optical and electrical inspection. Featuring high-speed, large-area optical inspection system, KLA CI T120 can quickly detect otherwise undiscoverable defects on both mask and wafer wafers and die. ICOS CI T-120 has several high-end features that made it an ideal solution for inspecting both mask and wafer wafers. The unit employs a state-of-the-art optical microlithography machine with a 16k optical array for high-resolution imaging, allowing for a machine vision solution. Additionally, the tool is equipped with a powerful computer processor providing ultra-fast analysis and reporting. KLA CI-T120 offers a wide range of inspection techniques, including bright field imaging, dark field imaging, electron microscopy, and X-ray diffraction. With these techniques, it can detect such defects as isolated defects, bridging defects, shorts, pinholes, and residue. Furthermore, it can also detect process-related defects such as overetching and undercutting. KLA has also included a suite of automated analysis and reporting features to reduce post-inspection review time. Its reliable, high-speed scanning and image recognition algorithms, along with its powerful software platform, enables automated defect review and reporting. Additionally, an intuitive user interface enables users to quickly identify and analyze defects. KLA CI T-120 is an economical option for manufacturers looking to inspect both mask and wafer wafers. With its advanced feature set and economical cost, CI T-120 is an ideal option for manufacturers who want to stay ahead in the competition.