Used KLA / ICOS CI-T120 #9237030 for sale

KLA / ICOS CI-T120 is a sophisticated inspection equipment designed for the wafer and mask fabrication industries. It utilizes a combination of advanced laser imaging technology, spectral imaging, and algorithmic analysis to detect microscopic particulates and other contaminants on the surface of semiconductor material. The inspection system includes a high-resolution laser imaging (HRLI) unit, which allows for real-time imaging of the surface defects on wafers and masks. It enables the operators to visualize any contaminants up to 25 nanometers in size, and to make precise adjustments to the setup to ensure repeatable results. KLA CI T120 also includes an advanced spectral imaging (SI) machine, which works in conjunction with the HRLI to detect slight differences in surface reflectance of different defects. The SI tool enables the identification of inconsistencies in defect surfaces that cannot be detected by the HRLI. The inspection asset is equipped with the latest algorithms for algorithmic analysis. This enables an automated inspection, allowing the detection of the tiniest defects. It symbolically clusters both defects and non-defects, and then applies various statistical models to identify contaminations. This allows the model to accurately detect and identify very small differences that may otherwise go undetected. ICOS CI T-120 is also modular and expandable. Its framework is designed to enable upgrading and the integration of additional inspection modules for advanced applications. In addition, the equipment offers both real-time control and offline analysis capabilities. Overall, KLA / ICOS CI T-120 is a robust and efficient wafer and mask inspection system. Its combination of HRLI, SI, and algorithmic analysis enables it to detect surface defects with unprecedented accuracy. Furthermore, its modular design allows for a variety of applications and the integration of additional modules for specialized tasks.