Used KLA / ICOS CI-T120 #9293270 for sale

KLA / ICOS CI-T120 is a high precision mask and wafer inspection equipment designed to enable quick, accurate, and reliable inspections of a wide variety of substrates, including masks and wafers of all sizes. The system utilizes advanced optical techniques to accurately detect, inspect, and measure defects on both mask and wafers, and can also be used to detect surface particulate defects. The unit features a large, solid-state, telecentric imaging column designed for maximum light throughput and image accuracy. This imaging column is combined with a highly sensitive CCD camera that captures high-quality images of mask and wafer surfaces. The machine can also be adjusted to accommodate different substrate sizes and shapes. In addition to its imaging capabilities, KLA CI T120 also features a high-end imaging tool, capable of high resolution measurements and investigations of particle anomalies. An integrated mechanical stage allows the asset to move the substrates incrementally allowing for accurate defect detection and imaging. Additionally, the model is also equipped with an automated mask aligner designed to accurately align and measure each mask design and ensure accuracy and repeatability. ICOS CI T-120 also features a highly efficient defect review and decision-making process. The equipment generates a detailed analysis report, featuring defect location, size, and characteristics, allowing for rapid and accurate detection and classification of defects. Additionally, the system features powerful user interface and automation capabilities, allowing users to quickly and easily customize inspections, add and remove wafers, and view images and reports. Overall, CI T120 is a powerful yet intuitive mask and wafer inspection unit, designed to detect and measure a wide variety of defects. The machine is capable of providing extremely high accuracy and provides a combination of detailed defect information and user interface functions. It is ideal for applications such as high volume mask and wafer inspection or batch process control. Additionally, thanks to its flexible design, CI-T120 is suitable for use in many other inspection and metrology applications.