Used KLA / ICOS CI-T120 #9360770 for sale

ID: 9360770
Vintage: 2006
Lead scanner 2006 vintage.
KLA / ICOS CI-T120 is a high precision wafer and mask inspection equipment that utilizes dual-directional illumination to make accurate measurements and detect defects. This system offers industry leading accuracy and speed in inspection of masks and wafers. KLA CI T120 features an advanced optical unit design providing a centered imaging machine utilizing two-axes of imaging ('Elevated and Reduced Defocus') to ensure the highest accuracy and thickness measurements. The tool can detect particles and defects such as scratches, contaminants, and other flaws on the mask or wafer surface in a single step, with automated defect classification. ICOS CI T-120 also features environmental conditioning systems that monitor and compensate environmental factors that can impact imaging of the wafer and mask. The asset offers superior performance in turbid environments as the range of environmental conditions is greatly reduced through advanced optical engineering, allowing images to remain crisp even in more challenging conditions. The model allows for fast data acquisition through its high-speed linear scanning, providing high-quality images with minimal impact on throughput. CI T120 also features an advanced modular design, which ensures optimal maintenance and replacement of parts. ICOS CI-T120 has a versatile range of inspection capabilities including mask inspections, wafer inspections, defect inspections, critical dimension measurements, and 3D depth measurements. It can be used for low to high volume production as well as for failure analysis applications. CI-T120 equipment provides superior accuracy and defect detection, making it an ideal choice for mask and wafer inspection. The system offers high speed data acquisition with minimal throughput impact for improved device yield rates. It's modular design ensures easy maintenance and replacement of parts ensuring maximum unit up-time. The advanced environmental conditioning machine ensures clear images even in harsh conditions. The tool also provides a wide range of inspection capabilities making it an ideal choice for low to high-volume production.
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