Used KLA / ICOS CI-T120 #9360928 for sale

KLA / ICOS CI-T120
ID: 9360928
Vintage: 2006
Lead scanner 2006 vintage.
KLA / ICOS CI-T120 is a mask and wafer inspection equipment that offers a reliable, complete inspection solution. The system contains built-in XY-stages to allow for precision control in placement of wafers or masks within the unit. The machine uses a 2D inspection optics tool which is optimized for large-area and fine-feature imaging. The optics asset consists of a high-precision motorized XY stage, a telecentric fixed focal length optical lens, and a Linescan or CCD camera. The field-of-view and depth-of-focus are adjustable, allowing for optimal image acquisition of wafers or masks that have varying features and thicknesses. The model is equipped with power to drive an Illumination Control Equipment, Printer/Plotter, Image Processor, and Image Analysis Unit. The illumination system is designed to ensure uniform luminance across the field of view and eliminate any non-uniformities, resulting in improved image quality and even detection of defects. The printer/plotter allows path program files to be loaded and allows images to be printed for review. The image processor allows the operator to adjust parameters, such as threshold or grayscale, contrast, and magnification. It features an integrated image library and can compare inspection images with reference images to detect any deviations. The image analysis unit allows for automated defect detection, including the identification and measurement of defects. The unit has high detection sensitivity and can detect both in-specification and out-of-specification defects. It also features an efficient defect management machine, allowing operators to review and classify defects. KLA CI T120 is a reliable, comprehensive mask and wafer inspection tool that offers high accuracy and resolution. It is designed to detect and measure both non-dimensional and dimensional features, and can easily be customized for specific applications. Its robust architecture makes it an ideal asset for defect detection and measurement applications.
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