Used KLA / ICOS CI-T120 #9407127 for sale

KLA / ICOS CI-T120 is an automated mask and wafer inspection equipment that enables high-precision visual inspection of photomasks, microvia masks and semiconductor wafers at up to 10,000x magnification. Using the latest high-resolution optics, KLA CI T120 provides automated defect review and measurement of particle contamination on wafers and patterned photomasks. The system features an optical microscope equipped with CCD cameras and advanced image processing algorithms that enable high precision wafer and mask defect detection, classification and analysis in just minutes. The auto-alignment feature ensures images are accurately registered, while image-processing settings can be optimized for different types of defects. Thanks to the unit's flexibility, it can support changing or expanding requirements, such as multiple production lots and varying defect search criteria. ICOS CI T-120 incorporates advanced automation capabilities to streamline inspection tasks. Autofocus and autocorrection features ensure reliable detection of opaque particles and other defects from challenging surfaces. Intuitive software provides an easy-to-use interface with powerful search functions for quickly finding specific defect types. Drag-and-drop windows can be used to compare image distinctions and rearrange to match inspection criteria quickly and accurately. The machine's advanced contamination and defect tracking capabilities are designed to reduce cycle times and help ensure wafer, mask, and yield performance. The comprehensive report tool automatically generates detailed analysis of quantitative defect data such as grade, area, count and size, while built-in menu options let users review, analyze and export data in just seconds. The robust and accurate KLA CI-T120 Mask and Wafer Inspection Asset provides the flexibility and automation necessary to easily handle changing and expanding requirements. With its combination of high-resolution optics and advanced image processing, CI T120 allows highly accurate inspection of both wafers and photomasks, with rapid defect detection and classification. The model's intuitive software, accompanied by advanced automation features, guarantees fast and reliable results - helping customers optimize their production process and ensure superior product quality.