Used KLA / ICOS CI-T130 #9202297 for sale

KLA / ICOS CI-T130 is a mask and wafer inspection equipment. It is designed to inspect integrated circuit photosensitive masks, wafers, and tapes in a single, automated platform. The system is designed for high throughput, unsurpassed accuracy, unsurpassed repeatability, and superior defect detection, and the ability to quickly identify and discriminate defects on these surfaces. KLA CI-T130's core technology is its integrated inspection engine. It combines a variety of electrical imaging, physical imaging, and optical imaging technologies to detect and characterize defects that may otherwise go undetected. Its onboard optical microscope provides high-resolution inspection and imaging capabilities. The unit uses a solid-state laser to focus on feature edges in order to detect subtle differences in patterns and sizes of features present on masks and wafers. The machine also includes advanced software, algorithms, and tools to support defect inspection, analysis, and correction. It has flexible inspection modes that make it easy to program and customize inspection for individual workflows. It is also capable of high throughput and can process over 800 wafers or masks per hour. ICOS CI-T130 utilizes a unique defect review technology to help discerning errors from false alarms. This technology analyses wafer or mask defect images to quickly pinpoint and identify defects even when traditional defects are close together. This allows it to successfully identify even the smallest defects, which are essential for accuracy in production. It also includes automated defect engineering tools to assist with repair and debug tasks, as well as provide engineering information. The tool is further supported by KLA predictive analytics and other advanced detection capabilities for identifying potential defects. It includes advanced digital algorithms and tools for characterizing defects to ensure they are quickly and accurately identified. It is also capable of providing advanced metrology services to measure and analyze wafer parameters in order to optimize the production process. Overall, CI-T130 is an industry-leading mask and wafer inspection asset that helps ensure maximum production efficiency and yield. Its advanced inspection engine, flexible inspection modes, and defect review technologies ensure industry-leading accuracy and repeatability. It also provides powerful analytics and metrology capabilities to optimize production processes.