Used KLA / ICOS CI-T1X0 #9351874 for sale

KLA / ICOS CI-T1X0 is a mask and wafer inspection equipment designed for high-performance defect inspection in advanced technology nodes. It provides a wide range of configurations that enable customers to customize their inspection systems for optimized inspection performance and for wafer and mask sizes. The base configuration includes a 6-inch by 8-inch scanning module, which facilitates high resolution inspection capabilities. Additionally, the system is compatible with a variety of wafer sizes up to 200mm. KLA CI-T1X0 features an illumination unit known as the Air Coated High-Numerical Aperture (AHN) Microscope. This high-precision optical imaging machine is designed to detect and focus on even the smallest defects on the mask and wafer surfaces. Additionally, the light source in the tool is a planar illuminator, which can be adjusted for perfect imaging alignment. The integrated high-definition camera provides fast and accurate defect imaging. It is equipped with a Hi-Vision Sensor, which is tuned to pick up even the smallest defects, from 0.8μm and up. Furthermore, the asset is programmed with ImageFocus+ algorithm, which helps to enhance the contrast and resolution, ensuring accurate defect detection. The model is built with durable, vibration-resistant components such as the hard-coated wafer chuck, to ensure high-accuracy scanning and imaging. Additionally, ICOS CI T1X0 is equipped with powerful computing capabilities, which are designed to process the data received from the microscope and camera. For every wafer scanning session, the equipment will generate and store a detailed defect report, including location, size, and type of the defect. KLA CI T1X0 is further enhanced with the latest software technologies and advanced analytics to support accurate wafer inspection and quick solutions to complex surface problems. Enhanced process control software is a powerful analysis tool that provides insights identifying trends and issues of interest in surface conditions and defects. Overall, KLA / ICOS CI T1X0 is a powerful mask and wafer inspection system for advanced technology nodes. It is an extremely reliable and efficient unit designed to deliver high-quality inspection results, ensuring accurate detection of even the smallest defects.