Used KLA / ICOS CI T620 #9237128 for sale

KLA / ICOS CI T620 is a highly advanced automated mask and wafer inspection equipment. It features a high-resolution color CCD imaging system with a 0.94 micron minimum feature size and 0.75 micron alignment accuracy. The advanced imaging unit utilizes a quadratic transformation algorithm to analyze and detect defects in the pattern, ensuring reliable imaging and accurate defect detection. Additionally, the machine features a high-speed optical transceiver capable of data rates up to 200MHz. This enables high-speed scanning of masks, wafers, and other fabrication processes. Furthermore, it offers an innovative defect detection tool which combines both visual inspection and automated electrical tests for an efficient, comprehensive detection process. KLA CI T620 is designed to automate and streamline the mask and wafer inspection process. It is capable of detecting a wide variety of mask and wafer defects and can be used during the fabrication and quality assurance stages of the production process. Additionally, the asset can be used to detect "killer" defects which, if undetected, could result in product degradation or malfunction. In order to meet the various requirements of different manufacturers, ICOS CI-T620 settings can be customized for each application. This ranges from fully automated modes to more in-depth manual modes. In addition, ICOS CI T620 integrates a number of software and hardware components, including a Programmable Logic Controller (PLC) and a variety of sensor and actuator technologies. This allows for optimized inspection results under diverse environmental and production conditions. Overall, CI T620 is an efficient, high-performance mask and wafer inspection model designed to increase quality control and reduce production errors. Its advanced imaging equipment, wide variety of technological features, and versatility make it an ideal option for manufacturers in the semiconductor fabrication and inspection industries.