Used KLA / ICOS CI T620 #9384157 for sale

KLA / ICOS CI T620 is a fully automated mask and wafer inspection equipment, designed to support the efficient production of semiconductor ICs. The system uses multi-angle, multi-dimensional imaging of patterned reticles, wafers, mask and related substrates in order to detect surface particles and defects. It is fitted with a high-resolution monochrome CCD cameras, with true color optics and a high-resolution LCD monitor used for viewing images. In addition, a high-power LED unit is used to illuminate the inspection targets, whilst two laser autofocus units are installed for targeting the inspection sites accurately. KLA CI T620 machine employs a range of scan options, in order to achieve best results from the inspection process. These include the standard "1x1" option, and the "2x2" option, which inspects the full area by scanning in both vertical and horizontal directions. The tool utilizes a variety of detection methods in order to differentiate between good and bad pixels. These include: gray level histograms, statistical pattern recognition, and defect density through local area analysis. A basic or advanced mode of inspection can be utilized, with the basic mode providing a quick scan for single or dual layers of mask and wafer. The advanced mode is suitable for multi-layer and ultra-fine device inspection. The asset also provides a large range of optional data analysis tools to help engineers better understand the results of their inspection. These include a defect review list, which allows users to view detected defects in a table format. Another popular option is the Defect Report, which provides a tabulated list of detected defects, along with additional parameters such as size, shape and material type. ICOS CI-T620 can be configured to detect and classify a variety of defect categories, including pattern recognition and foreign material. It is able to perform defect screening using several methods, such as electrical testing, electron microscopy technology, and electric fan-out analysis. The model ensures efficient sampling through three sample modes - focus-exposure (FE) mode, variable-focusing method (VFM) and two-stage sampling method (TSM). CI-T620 is a reliable equipment, with a fast response time and features that can be customized based on specific application and keeppace with advancing technology. It provides accurate and reproducible inspection results, allowing engineers to quickly fix any defects and improve the overall quality and reliability of their manufactured products.