Used KLA / TENCOR 0116358-001-REV A #293649651 for sale

KLA / TENCOR 0116358-001-REV A
ID: 293649651
MI ZCB Assy PHX E84 LT ( EW1401 ).
KLA / TENCOR 0116358-001-REV A 'Mask & Wafer Inspection' equipment is a wafer and reticle inspection system with dual-camera optics and a pixel size of (20µm) to provide industry leading metrology results. The unit is comprised of several components including a high-magnification color camera, a high dynamic range (HDR) imaging machine, a sample stage with high speed motion, and a variety of specialized software programs. The high-magnification color camera allows for detailed inspection and analysis of unpatterned and patterned wafer surfaces and defects. Additionally, the camera provides high resolution imagery that allows for the quantitative analysis of isolated defects along with automatic edge-detection. The high dynamic range imaging tool provides increased sensitivity to defects, enabling more detailed analysis. This asset is designed to recognize edge details and local features with the help of a variety of specialized algorithms, providing an improved understanding of process failure in semiconductor manufacturing. The sample stage offers a range of high speed motions, allowing for fast and accurate inspection of high volumes of wafers. Each segment of the sample stage is composed of two linear motors, providing extremely fast and precise movement. In addition to the hardware of KLA 0116358-001-REV A, there are various specialized software programs designed to provide complete metrology results. The software includes systems for defect review and classification, defect inspection, die-to-die mapping, wafer measurement, and image analysis. Furthermore, automated algorithms enable efficient and accurate wafer map generation with reduced time and cost. Overall, TENCOR 0116358-001-REV A 'Mask & Wafer Inspection' model is designed to provide high-resolution, accurate measurements while reducing cycle times and costs. Its powerful features and specialized software provide complete metrology results, providing a comprehensive understanding of process failure in semiconductor manufacturing.
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