Used KLA / TENCOR 2 XX #9009649 for sale

KLA / TENCOR 2 XX is a mask and wafer inspection equipment optimized for medium to large volume production and is designed to minimize cost of ownership while delivering the highest accuracy across a wide range of applications. The innovative design combines defect inspection, automated defect classification and review capability into one complete tool. KLA 2 XX system offers highly accurate, high-speed defect detection, at up to 70 times magnification, and address defect types including line width, particle/contamination, bridge and open defects. The application-specific image acquisition and feature extraction algorithms guarantee quality results regardless of the material being inspected, while the M-Vision Particle/Contamination Analysis package distinguishes particles from the background by morphology. TENCOR 2XX unit features an automated contour analysis and outlier deletion strategy for true defect characterization for processing line width and bridge defects, making it an ideal tool for defect reference data generation. Additionally, thAe automated defect review process, with 10x outline and 84x PEM zooming and automated defect identification, accurately classifies defects for better follow up and yield improvement. The machine's high throughput and accuracy is supported by a user-friendly integrated software interface capable of analyzing up to 500 wafers per hour. What's more, additional software packages provide further capabilities such as stress and distortion analysis, topography recognition and defect level measurement. Built-in redundancy and reliability features ensure 2XX tool runs smoothly and that long-term performance is maintained, while the network-based asset architecture makes sure all data can be shared among global production facilities. The model comes with a global support network and a variety of options, upgrades and accessories are available depending on the user's application.