Used KLA / TENCOR 201 #293635802 for sale

KLA / TENCOR 201 is an automated inspection equipment for Mask & Wafer fabrication. It is used to ensure that masks used in lithography and other processes are defect-free. The system is comprised of two parts: the Mask-Inspection Station (MIS) and the Wafer-Inspection Station (WIS). The MIS is designed to inspect up to 4-8 flat, high-resolution optical fields of a 2-sided or 2-layer mask. The MIS is used to detect defects in the photomask pattern with very high sensitivity, allowing for full defect coverage. It is capable of analyzing different kinds of process-induced defects and offers precise defect coordinate measurements. The machine automatically recognizes different die sizes and accepts variety of masks. The WIS inspects up to 8 flat, high-resolution optical fields of a 4-inch or 6-inch wafers. It provides an accurate defect detection without missing any defects. This machine offers both interior and perimeter defect coverage with a pass/fail determination and a detailed defect map. The WIS also allows for optical signature recognition, an effective tool for detecting process residuals, structural defects, and other production issues. KLA 201 is capable of operation in class 100 cleanroom environments and comes with user-friendly software that allows remote access from any PC. The unit offers a comprehensive control over the whole process and monitor cycle and supports multiple languages. Overall, TENCOR 201 is a reliable and efficient mask & wafer inspection machine. It is designed to detect different kinds of defects and offers superior reliability with precise defect measurement. This tool is suitable for semiconductor manufacturing, mask and wafer fabrication, and other related industries.