Used KLA / TENCOR 201 #293651161 for sale

ID: 293651161
Vintage: 1988
Mask inspection system 1988 vintage.
KLA / TENCOR 201 is a state-of-art mask and wafer inspection equipment that provides high resolution images and defect recognition to semiconductor manufacturers in the production and post-production process. The system is designed to streamline inspection and enable the rapid identification of defects and features on both mask and wafer geometries. With an enhanced combination of electro-optical and short-wavelength technologies, KLA 201 engineering unit can achieve nanoscale resolutions while maintaining high throughput and yield performance. The machine is comprised of several components that leverage the power of its latest Gen 3 optical technology. It features a series of automated vision systems that detect minor variations in the mask and wafer substrates, as well as the formation of defects. The tool also has the ability to inspect a range of processed substrates from simple structures to complex designs. The asset is equipped with a high resolution imaging model that enables precise detection and classification of defects. Additionally, the equipment includes a high power inspection light source to ensure a consistent and accurate assessment of the substrate's defects. TENCOR 201 optical system also includes image analysis and metrology software for defect recognition and process identification. It utilizes advanced pattern recognition algorithms to identify smaller defects that may be otherwise missed. Additionally, the unit provides the ability to identify and analyze various features of both masks and wafers. This enables the detection of corrections or improvements that may be required before the device proceeds with further process steps. The machine is equipped with a range of advanced tools and toolsets to evaluate different inspections. It uses stain and imaging analysis, as well as automated inspection to ensure defect detection at each stage of the production process. This allows the overall yield to be improved and provide more accurate results. 201 mask and wafer inspection tool is an invaluable tool for semiconductor companies and wafer manufacturers, providing robust solutions and increased yield performance. Its sophisticated vision asset and image analysis capabilities provide confidence in the visual assessment and defect recognition of any device.
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