Used KLA / TENCOR 201 #293651162 for sale

KLA / TENCOR 201 is a UV imaging mask and wafer inspection equipment. It is a high-end system designed for the most demanding semiconductor and LCD panel applications. It provides rapid inspection of mask patterns and wafers for a variety of technologies, including microfabrication, thin film transistor (TFT) fabrication, and advanced packaging. The unit's image acquisition and analysis functions can inspect masks and wafers more accurately and quickly than traditional inspection technologies. It offers rapid optical defect detection and classification of patterns, which increases production yields and greatly reduces inspection time. The machine is configurable for either high-volume or specialty inspection applications. It features a modular design that allows it to be configured to meet specific application needs. It is an open architecture tool, enabling the user to add additional components to analyze more complex defects. KLA 201 asset features an automated wafer loading model and a large library of defect detection and classification algorithms. Its advanced imaging and analysis capabilities track defects as they appear on the wafer surface and allow the user to accurately identify and classify them. A key feature of the equipment is its ability to detect and classify defects that are otherwise undetectable by traditional inspection technologies. It also offers real-time correlation between images and the defects that it detects. This allows the user to easily analyze defects and determine their causes for corrective action. For the highest precision results, TENCOR 201 has a full calibration suite, enabling fast and high-accuracy testing and analysis. It also supports external data acquisition and third-party calibration systems, allowing the user to further customize the inspection process. The system features an intuitive user interface, making it easy to accurately verify results and adjust parameters. In addition, the unit is backed up with support from KLA team of experts, offering additional insights into the machine's operation and tool-specific data interpretation advice. Overall, 201 is a powerful and versatile mask and wafer inspection asset that offers advanced imaging and analysis technology for the most demanding semiconductor and LCD panel applications. It is ideal for users looking for rapid defect detection and classification of patterns, as well as real-time correlation for the most accurate analysis of defects.