Used KLA / TENCOR 2111 #293642296 for sale
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KLA / TENCOR 2111 is a sophisticated mask and wafer inspection equipment designed for the rapid screening of photomasks and wafers. It utilizes a full-field area scan to detect critical defects in photomask designs and lithographic process layers making it ideal for mask and wafer fabrication and process control. KLA 2111 is equipped with a high resolution digital imaging system which captures image data over the entire field of view. This data is then processed by an advanced light array of algorithmic correction and pattern recognition to identify defects. Along with image analysis, the unit also has an articulated microscope to enable microprobing of critical defects. The machine is capable of inspecting layers of any thickness and type up to 4.20" (10.6 cm) in size. It is capable of inspecting and measuring patterns from 8 to 809 µm, with fine features of 5 µm being detectable. Additionally, it has a fine line resolution of 0.5 microns for advanced mask and wafer defect detection. TENCOR 2111 is also equipped with intuitive software that allows for easy navigation and comprehensive results analysis. This intuitive software ensures accuracy and reliability in mask and wafer quality control processes. The software also allows for data to be stored and shared across multiple areas of the factory, which can help minimize the time taken for defect analysis and reporting. The instrument is versatile enough to perform several different inspection types, including light source and dark field, at multiple angles to detect defects that could lead to serious production delays. It also offers high accuracy and repeatability in terms of inspected surface data, and quality standards certification. Additionally, it is able to detect closed patterns, open patterns, and multi-layer patterns. 2111 is an ideal tool for mask and wafer fabrication and process control, offering high quality results and easy to use software. The asset has a wide range of applications, making it suitable for a variety of high-end lithography processes.
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