Used KLA / TENCOR 2131 #168852 for sale

KLA / TENCOR 2131
ID: 168852
Defect Wafer Inspection System Slight scuff marks on machine.
KLA / TENCOR 2131 Mask and Wafer Inspection Equipment is a comprehensive inspection system for wafer mask inspection, metrology, and defect review. Designed for easy use and high performance, the unit provides automated image acquisition, image inspection, and defect review to ensure high yield and process control. KLA 2131 features a high-resolution CCD camera and illumination module designed to capture defect images with high accuracy even on challenging masking technologies. This allows users to detect and characterize the full range of defects, including pinholes and surface contaminants, as small as 0.02 micron. The machine also features an automated control tool which enables rapid device alignment, pattern matching, and defect identification. This allows users to easily troubleshoot and analyze defective masks, ensuring process control and high yield. TENCOR 2131 also includes an advanced metrology tool for high-precision measurements of wafers. This metrology tool includes an accurate, high-speed optical alignment asset which ensures high accuracy and reproducibility. The model also includes a wide variety of advanced measurement and characterization algorithms to accurately measure the parameters of defect images, including thickness, surface temperature, and other characteristics. 2131 also features an intuitive user interface which allows users to quickly navigate between different functions and review images. Additionally, the mask & wafer inspection equipment can be easily integrated into existing systems, enabling high-speed data exchange and efficient machine-to-machine communication. In summary, KLA / TENCOR 2131 Mask and Wafer Inspection System provides a comprehensive suite of tools for fast and accurate masking inspection, metrology, and defect review. With its automated control unit and high-resolution CCD camera, the machine enables users to accurately detect and characterize defects down to 0.02 micron, ensuring high yield and process control. Additionally, its intuitive user interface and easy integration into existing systems makes the tool highly efficient and productive.
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