Used KLA / TENCOR 2131 #293587730 for sale

KLA / TENCOR 2131 is a mask & wafer inspection equipment that is designed to accurately detect large defects on reticles and wafers. It utilizes an advanced, high-resolution imaging system, which is combined with a library of physics-based models to precisely identify a wide range of defect types. The unit can handle various inspection sequences such as defect review, mask-to-wafer comparison and isolations, enabling OEMs to rapidly and reliably inspect reticles and wafers. The machine is equipped with a high-resolution imaging tool providing superior image contrast and the ability to capture defects over a wide dynamic range. It can accurately detect defects down to a few nanometers in size and has the flexibility to process a wide range of input materials such as pellicles, glass wafers, quartz wafers and IC wafers. The library models in the asset are designed to quickly and accurately identify a variety of potential defect types, from missing electrical components to numerous other physical imperfections. The library of models consists of physics-based models and basic structural models for edge defects, line defects, composite defects, missing elements, and others. The library allows users to build their own customized models and to detect defects even under difficult illumination conditions, such as low-intensity polarized light. The model is also supplied with powerful data-analysis software, which allows users to analyze images, and to perform a variety of operations, such as data correction, enhancement and shade equalization, to improve defect detection across a wide range of materials. The data-analysis and defect-detection software enable OEMs to gain insights into root causes, to assess and analyze defects, and to provide timely feedback to the designers. KLA 2131 is the ideal tool for a wide range of mask and wafer inspection applications, guaranteeing high accuracy and throughput. Its intuitive user interface, powerful library models and data-analysis software enable reliable and accurate inspection of masks and wafers. It also helps reduce the time to market for critical integrated circuits applications.