Used KLA / TENCOR 2131 #293752263 for sale

KLA / TENCOR 2131
ID: 293752263
Vintage: 1994
Wafer inspection system 1994 vintage.
KLA / TENCOR 2131 is a device used for the visual inspection of semiconductor masks and wafers, providing comprehensive defect inspection capabilities with higher accuracy than traditional methods. The equipment features a broad array of features and applications which can be tailored to meet specific requirements, making it an indispensable tool in semiconductor manufacturing. The system utilizes patented shadowing technology, which uses sensors to detect the presence of defects in semiconductor masks and wafers. It then applies an algorithm to determine the exact location and size of each defect. During operation the unit can detect scratches, particles, voids, nonuniformities, and other contaminants. Furthermore, for each type of defect the machine can determine the color and brightness of the surface, as well as the size of the defect. With this information, the tool flags potential defects from the wafer or mask for further investigation. In addition to defect detection, the asset also provides a variety of imaging options for applications such as overlay, flatness, and line width measurements. The model comes with a software suite that includes a 3D viewer, allowing the user to view multiple images at once and easily navigate through them. It also has the capability to detect material defects in the wafer, such as diamond trenching, step detection, and more. The equipment itself is housed in a secure, environmental-controlled cabinet and consists of a high-resolution color LCD display and an optical sensing head assembly. The optical head is rotatable over 360 degrees with an angular resolution of 0.001 degrees. The system also features LEDs and prisms to differentiate between features, as well as several built-in filters to adjust the light intensity or change the spectrum of the image. KLA 2131 is a highly reliable and accurate unit used for the detection and assessment of defects on semiconductor masks and wafers. Its advanced algorithms, combined with superior optical components, offer unmatched precision and performance. The machine is also easy to operate, and comes with several user-friendly software applications. In conclusion, it is an invaluable tool for semiconductor manufacturing, and is an ideal choice for quality control applications.
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