Used KLA / TENCOR 2131 #293815220 for sale

KLA / TENCOR 2131 is a mask and wafer inspection equipment, designed for the most demanding production and high-volume throughput requirements. The comprehensive KLA 2131 Advanced Defect Inspection System offers the industry's leading semiconductor manufacturers a powerful combination of features, including in-depth wafer and reticle defect detection. TENCOR 2131 has been engineered to meet the demanding requirements of production, quality and process control within a single unit platform. 2131 machine incorporates a multi-channel optical architecture, high-resolution scanning stage and fast image acquisition. This combination creates a high throughput inspection tool that has the capacity to defect inspect 300mm, 200mm, and smaller die sizes supporting optical resolutions from 0.7 microns to 5 microns, covering the widest range of device geometries. The asset is housed in a fully automated, quiet, easy-to-use design, designed to optimize process and reduce cycle time. KLA / TENCOR 2131 offers integrated advanced defect detection capabilities, allowing customers to compare actual results to expected performance. The defect detection software will alert users of any anomalies in a process, such as critical-dimension defects and other minor performance issues. The model also provides a customizable graphical user interface that is easy to use and easy to understand. KLA 2131 offers optical layers inspection with 4 or 8 layer models optimized for certain technology. It allows users to inspect specific layers or a combination of layers (to optimize the precision of the inspection). It also has a wide dynamic range which enables the users to compensate for varying material thickness or layer patterns. TENCOR 2131 is capable of making measurements and comparisons in multiple sites with high accuracy and repeatability. The equipment also includes map-based defect review features such as defect scanners and map viewers that help users visualize the process results and make quick decisions. Additionally, it provides wafer-level non-optical inspection capabilities such as 3D critical-dimension, micrograph review and automated Stitch Probing. 2131 provides advanced data acquisition and analysis capabilities, such as report generation, histograms and trends analysis, to support process and yield control. The data from the system can be stored in SPC-formatted files for use in data analysis tools. In sum, KLA / TENCOR 2131 is an advanced mask and wafer inspection unit designed for the most demanding production and high-volume throughput requirements. It features an easy to use graphical user interface, powerful defect detection software, map-based defect review abilities, and robust data acquisition and analysis capabilities. This machine ensures precise defect inspection and process control on a variety of semiconductor structures of different sizes and shapes.