Used KLA / TENCOR 2131 #293821531 for sale

KLA / TENCOR 2131
ID: 293821531
Wafer inspection system.
KLA / TENCOR 2131 is a high-precision Mask & Wafer Inspection Equipment designed to pinpoint micro-defects in the most complex semiconductor materials. The system combines next-level optics, illumination, and image-capture technology to identify even the most microscopic anomalies or contaminations on surfaces with an unrivaled combination of repeatability, accuracy, and sensitivity. KLA 2131 is engineered with a dual optical unit providing superior imaging of even minuscule grain lines and particles. The machine's Dual Channel Light Tool produces up to a billion different illumination angles which are measured and adjusted for optimal results. With the option of a double camera asset, the user can select either an uptilted angle for wider field of view or an oblique angle for higher definition image. The guide holes feature allows for accurately positioning the wafer on the stage, so that the wafer can be inspected from multiple angles. TENCOR 2131 is equipped with a new laser-based pattern recognition that identifies defects as small as 0.1um. This advanced technology is designed to enable analysis of defect images to determine their characteristics and enable optimization of process flows. Furthermore, 2131 has the capacity to accurately analyze through layers containing multiple die structures, making it even more able to detect ultra-tiny defects. The model is also armed with a comprehensive suite of image-correction tools, to include Auto Focus, which uses unique algorithms to bring out details of the fine structures from complex wafer patterns and inspect them clearly. The Inspection Software enables user to quickly create complex patterns and easily operate the equipment. KLA / TENCOR 2131 is designed to deliver right on target performance, and provides a reliable, efficient, and cost-effective solution for quality assurance and problem solving in the semiconductor industry. The system's features will help to ensure that defect sizes, shapes, and locations can be accurately and consistently identified repeatably, providing customers with unmatched defect detection performance.
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