Used KLA / TENCOR 2131 #293824933 for sale

KLA / TENCOR 2131 is a mask and wafer inspection equipment designed for semiconductor manufacturers to ensure high quality products. It uses advanced light microscopy technology to provide 20nm resolution on both the wafer and mask level. The system is composed of several subsystems, including an advanced optical subsystem, a motion control subsystem, a control and measurement subsystem, and a sample handling subsystem. At the heart of the unit is the advanced optical subsystem which is composed of several components, including a precision optical machine, an image acquisition tool and an image analysis asset. The precision optical model uses high quality microscope objectives lenses to provide high resolution images of the sample. The image acquisition equipment is capable of either single or multiple passes over the sample and can provide both box scans and line scans. The image analysis system is used to detect defects in both the mask and wafer level. The motion control subsystem is responsible for providing precise control of the optical subsystem's position over the sample. It consists of several high precision motors and controllers that allow the unit to make fine adjustments in order to provide highly accurate results. The control and measurement subsystem is used to control the entire unit and capture measurements from the sample under inspection. It consists of several units, including a central processing unit, a data storage machine, a display and an input device. The data storage tool stores the images captured by the optical subsystem for later review and analysis. The display and input device provide the operator with feedback and control ability over the asset. The sample handling subsystem is responsible for placing the sample into the model and then removing it following the completion of the inspection. It consists of several components, including a pick-and-place subsystem, a sample transport subsystem and a sample processing subsystem. The pick-and-place subsystem places the sample onto the stage of the equipment. The sample transport subsystem is responsible for moving the sample to the desired position for inspection. Finally, the sample processing subsystem is responsible for preparing the sample for inspection depending on the required process. In conclusion, KLA 2131 is a specialized mask and wafer inspection system designed for use in the semiconductor industry. It uses advanced optics, motion control, and sample handling systems in order to provide 20nm resolution on both the mask and wafer level. The unit is reliable and efficient, allowing for quick and accurate results for any semiconductor manufacturing process.