Used KLA / TENCOR 2131 #9158749 for sale

KLA / TENCOR 2131 Mask & Wafer Inspection equipment has been designed to provide high accuracy, high review capability, and repeatable results for mask and wafer inspections in semiconductor manufacturing. This automated inspection system is capable of reviewing up to 70,000 masks and wafers per hour, and utilizes a 5-inch FOV collimated laser optics and a CCD-based imaging unit with a resolution of 1 micron per pixel. KLA 2131 Mask & Wafer Inspection machine is equipped with a powerful image processing algorithm that enables quick and accurate detection and identification of defects as small as 0.2 microns. This tool also includes several built-in capabilities to ensure quality, such as real time alignment and auto focus. In addition, the asset is equipped with a high performance vision-based defect inspection model that is capable of reviewing masks and wafers for defects, contamination, and equipment components. TENCOR 2131 Mask & Wafer Inspection system is designed to allow for easy integration of multiple platforms, quality control tools and different types of equipment. This unit is compatible with a range of integrated defect review and fault characterization tools, such as defect review computers, quality control tools and electrical test systems. 2131 machine also supports multiple masks and wafers at the same time, which allows for a quicker review for large wafer and mask sets. Furthermore, the tool features a data management asset that enables fast and accurate review and resolution of defect data, which increases the efficiency of the inspection process. The model also offers several monitoring and reporting functions, such as a Process Monitor, which provides an integrated view of the entire mask and wafer inspection process in real time. The equipment also includes a high-level control (HLC) software that can be customized to meet different manufacturing requirements and provide the highest-level defect review accuracy. Overall, KLA / TENCOR 2131 system provides fast and accurate inspection for masks and wafers with repeatable results, and is capable of integrating with a range of defect review and fault characterization tools. This unit also has a powerful image processing algorithm, a data management machine, and a range of monitoring and reporting functions that ensure high defect accuracy.