Used KLA / TENCOR 2131 #9236722 for sale

KLA / TENCOR 2131 Mask and Wafer inspection equipment is designed for the highest levels of accuracy and sensitivity in the production of semi-conductor components and devices from a broad range of materials and geometries. Utilizing advanced optics and digital image processing, this high-tech machine enables the reliable detection of the smallest defects and process abnormalities during the manufacturing stage. The system is capable of accomplishing a variety of wafer and mask inspections and measurements upon the request of the user, including thin-film photomask inspection and measurement of film thickness, transparency, linearity, and thickness uniformity. The optics of KLA 2131 are designed to permit inspection of a variety of mask features and parameters with exceptional sensitivity. These features and parameters include microscopic of sub-microscopic features such as photomask lines, gratings, squares and circles, trench, spaces and separations, line widths, patterns, designs and profiles. The optics employ a full-field optical incoherence and a z-lifeline dynamic to achieve improved sensitivity in the surface scan. By utilizing the z-lifeline dynamic, the machine can detect even the smallest defects with a high level of accuracy and sensitivity. By utilizing specialized pattern recognition software, the machine is able to identify various shapes and structures on both the top and bottom surfaces of the wafer or mask. This software also allows for the comparison of shapes and patterns for quality assurance, allowing for an in-depth analysis of surface features. The software can distinguish between processes that are completed successfully and those that have issues or abnormalities. TENCOR 2131 offers further analysis and annotation capabilities to quality control engineers and provides data in a point-and-click format to help identify issues quickly. With a built-in unit of report generation, this machine allows for precise and accurate reporting of results. Furthermore, the software can compare results to customer-defined light sources, masks, and specific parameters. 2131 Mask and Wafer Inspection Machine allows for superior accuracy and sensitivity in the production of semi-conductor components and devices. Its advanced optics, pattern recognition software, and report generation capabilities make it an ideal choice for processing even the most precise components. This sophisticated tool of inspection and measurement allows for reliable detection of irregularities and precise comparison of shapes and patterns for quality assurance.