Used KLA / TENCOR 2131 #9383244 for sale

KLA / TENCOR 2131
ID: 9383244
Wafer inspection systems With 2552.
KLA / TENCOR 2131 is a mask and wafer inspection equipment that is designed to provide reliable and high-precision defect detection. It is capable of inspecting a variety of substrates, including semiconductor wafers, flat-panel displays, non-volatile memory chips, organic light-emitting diodes, and solar cells. Features include automated recipe building, wafer mapping, defect recognition, and classification. The system uses automated alignment mechanisms to precisely align the substrate against the window that has the integrated sensor elements. This allows the mask and wafer positioning to be extremely accurate to prevent errors due to misalignment. The integrated sensors use a combination of optical and imaging techniques to detect a wide range of defects on the substrate. These techniques include bright-field imaging, dark-field imaging, through-probe illumination (TPI), and area-scanned imaging. The unit is also capable of detecting a range of defects, such as particles and contamination, voids and opens, wrinkles, tears, and phase abnormalities. The defect detection machine is integrated with a defect classification and review module to assist technicians with the evaluation of the results. The information collected by the tool is stored in a user-defined database for efficient and accurate defect analysis. KLA 2131 is designed with an ergonomic user interface, making it simple to operate. The GUI provides clear, concise visual feedback on the status of the asset, making it easy for technicians to monitor the inspection process. Furthermore, it has the flexibility to accept a variety of user defined parameters, making it highly customizable to meet the requirements of specific industries. Additionally, the model is equipped with a diagnostic port that facilitates automatic equipment health assessment, allowing technicians to quickly identify and address any issues. Overall, TENCOR 2131 is an advanced system designed for reliable and accurate inspection of masks and wafers. It has a high degree of flexibility, making it suitable for a wide range of substrates and defect types. It also has a user-friendly interface that makes it easy to use for technicians, and a wide range of additional features that make it highly customizable.
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