Used KLA / TENCOR 2131 #9404524 for sale

KLA / TENCOR 2131 is an automated mask and wafer inspection equipment designed for semiconductor fabrication processes. It can be used for both optical and die-to-die metrology applications. The system utilizes two workstations, one for alignment and the other for final inspection. The alignment workstation houses two alignment modules, a self-alignment module and an automated alignment module. The self-alignment module uses advanced image analysis techniques to self-align the wafer to the required pattern. The automated alignment module uses programmed masks to identify and align the wafer. The final inspection workstation is equipped with multiple sensors that measure both pattern and defect defects. These sensors include an optical microscope array, X-ray, electron microscope, and CMOS sensor. The unit also has a single defect classification module, which is capable of measuring multiple defects simultaneously. The machine has a high inspection speed, with up to 10,000 wafers per hour, making it suitable for a high-volume production environment. Additionally, it can accurately detect yields of 80% and greater, allowing it to be used in a wide range of process conditions. The tool is also capable of analyzing the measurements and automatically giving pass or fail results, allowing for faster process retooling. Furthermore, it features an intuitive user-friendly graphical interface, allowing for easy setup and operation. KLA 2131 is an essential tool for high-precision mask and wafer inspection. Its high speed, high accuracy, and intuitive user interface makes it suitable for a wide range of applications. Whether used for small-volume runs or large-scale production, TENCOR 2131 can help optimize inspection results and improve yield.