Used KLA / TENCOR 2131 #9404525 for sale

KLA / TENCOR 2131 Mask and Wafer Inspection Equipment offers high-performance, state-of-the-art semiconductor wafer inspection for scanning electron and optical microscopes used in a wide range of semiconductor manufacturing applications. The system is designed to accurately detect and classify defects on photomasks and wafers, and can accurately classify multiple defects on a single wafer. The unit is designed for production environments and is scalable to address the needs of high-volume wafer inspection tasks. KLA 2131 machine features an advanced automated defect inspection algorithm which can detect small defects, such as broken-bridge pairs, pinholes and voids, while simultaneously classifying alternative defect classes, such as point defects, particulates and fringe features. This tool's automated detection and classification workflow can detect a wide range of defects on the wafer without introducing additional complexity or labour-intensive manual operations, allowing high-throughput and reliable performance. The asset can generate detailed data in both the form of 3D topographic images and quantitative spectral measurements, providing users with accurate and actionable information about the manufacturing process. The model also offers software for managing customers' detection algorithms, grouping wafers for analysis and for setting up complex failure modes analysis. The software enables users to customize their inspection equipment to meet their specific application needs and to optimize their processes. KLA proprietary wafer-handling technology allows for seamless, airless handling of wafers and can be integrated into existing process management flow. The system's advanced vision unit, combined with automated motion control, accurately locates defects on the wafer and can quickly move between different substrate heights to reduce potential substrate handling errors. TENCOR 2131 also features edge lighting and digital polarization technology to cancel out non-defective areas of a wafer, allowing the automated machine to more quickly focus on the areas of concern. This tool is highly configurable and can be customized to meet the needs of a variety of inspection applications and processes. In conclusion, 2131 is an advanced and reliable asset for detecting and classifying potential defects on photomasks and wafers. This model offers users high-throughput, detailed data, and integrated software and hardware features which enable optimized and accurate defect detection and classification processes.