Used KLA / TENCOR 2131E #9181395 for sale

KLA / TENCOR 2131E
ID: 9181395
Wafer inspection system.
KLA / TENCOR 2131E Mask & Wafer Inspection Equipment is a reliable and robust wafer-handling and optical inspection system for back-end semiconductor integrated circuit fabrication. It is renowned for its performance and accuracy when conducting a thorough, comprehensive wafer and mask inspection. KLA 2131E features an automated wafer handling unit that moves and processes wafers quickly and accurately. It achieves this by employing advanced algorithms that analyze light patterns and then make high speed measurements of each wafer and its associated Mask Alignment Mark (MAM). The machine can also make accurate measurements of errors on both wafers and masks, including critical dimensions (CD) overlays, clear field, and IPC-9151. TENCOR 2131 E has an advanced optical tool that includes three CCD cameras, which are used to acquire images of the wafers and masks. These cameras have a high dynamic range and are sensitive to nanometer-level details. To provide further accuracy for the device, KLA / TENCOR 2131 E also employs optical targeting systems and laser modules to perform accurate wafer registration. KLA 2131 E also includes a high-powered image analysis asset to detect defects in real time. This model is capable of detecting defects down to µm sizes and can also detect any small variations in critical dimensions. To ensure accuracy in its analysis, the equipment has an integrated probing system and projectors for accurate overlay measurements. 2131E has a user friendly design, with all of its components and processes automated for maximum convenience and efficiency. Additionally, the device has the ability to read various wafer types, including flat panel and bowtie shapes, and is complemented with a reliable, comprehensive warranty plan. In conclusion, TENCOR 2131E is a reliable and accurate Mask & Wafer Inspection Unit, designed for back-end semiconductor integrated circuit fabrication. Its automated wafer handling machine and advanced optical and image analysis systems allow for precision, accuracy, and convenience during each and every inspection.
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