Used KLA / TENCOR 2131E #9384645 for sale

ID: 9384645
Vintage: 1994
Wafer inspection system 1994 vintage.
KLA / TENCOR 2131E is a high-performance, mask and wafer inspection equipment designed for the semiconductor industry. It is the latest in the series of multi-channel, image-based inspection systems from KLA. This system utilizes an advanced array of computational tools and technologies that provide a comprehensive and systematic approach to inspecting wafers, masks, and other composite parts. KLA 2131E is based on TENCOR TrueImage Technology platform, consisting of a suite of advanced inspection algorithms and imaging tools. This unit is capable of detecting contamination, defects, imperfections, and variations on the surface of the items being inspected. In addition, the machine can measure sizes, angles, tolerances, and other important parameters. The advanced inspection tool also makes use of the patented MaxBright Sensor Technology that produces superior image quality compared to previous models. This technology ensures that no details on the surface of the objects being inspected are missed. The asset employs high-precision, multi-megapixel CMOS imaging sensors that provide up to 12 million pixels per frame. TENCOR 2131 E also offers an extensive range of inspection programs that have been designed specifically for efficient and comprehensive defect assessment. This state-of-the-art model features an intuitive user interface that enables the user to select the most appropriate inspection criteria and parameters with ease. 2131 E offers fast and reliable performance with maximum throughput rate of up to 14000 wafers per hour. This equipment delivers the highest throughput rate in its class and is designed to achieve high utilization during operation. It also offers reduced cycle times and near-infinite capability of on-the-fly data collection and analysis. In addition, KLA / TENCOR 2131 E is equipped with an advanced system of fault diagnosis. This allows the user to quickly identify and troubleshoot potential issues, reducing downtime and improving efficiency. This unit also allows for real-time wafer tracking and analysis, greatly reducing set-up times and speeding up production. Overall, 2131E is a powerful, accurate, and efficient mask and wafer inspection machine that can help to ensure the highest quality results. Its advanced features make it one of the most advanced systems on the market, making it an ideal solution for many businesses and industries.
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