Used KLA / TENCOR 2132 #139716 for sale
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ID: 139716
Wafer defect inspection system
Includes:
KLA / TENCOR 2132 wafer inspection unit (primary)
KLA / TENCOR 2132 wafer inspection unit (secondary)
KLA / TENCOR 2552 data analysis station
KLA / TENCOR 2132 power line conditioner
Specifications:
KLA / TENCOR 2132 wafer inspection unit (primary):
Label model: KLA-2131, front panel reads "2132"
Chuck installed: 8"
Power cable intact, all other cables cut
Front upper panel cover shocks / struts are worn
Missing: PC, 1-2 body panels
Power rating: 120VAC, 25A, 50/60Hz
1994 vintage
KLA / TENCOR 2132 wafer inspection unit (secondary):
Label model: KLA-2131, front panel reads "2132"
Body panel does not fully mount
Power rating: 120VAC, 3-phase, 25A, 50/60Hz
1994 vintage
Components:
KLA PC/IF 486/66 PC system, p/n 750-660859-00
Dual monitors
Keyboard
Trackball
Modules installed:
KLA PC/IF 486/66 PC system, p/n 750-660859-00
KLA Memory Controller Phase 3, p/n 710-658232-20
FAB, p/n 710-658085-00
(2) Mass Memory 2 Phase, p/n 710-658051-20
(2) KLA CornerTurn 3, p/n 710-655651-20
(2) Y-Interpolator, p/n 710-658172-20
(2) X-Interpolator, p/n 710-658177-20
UNIQUENESS Processor, p/n 073-658045-00
Alignment Processor Phase 3, p/n 710-658041-20
Alignment Processor (AP1), p/n 710-65803620
Defect Filter (H.R.), p/n 710-659724-00
Defect Processor Phase 3, p/n 710-658075-20
KLA DP, p/n 710-650099-20
KLA DD, p/n 710-650044-20
KLA DF FAB PH3073, p/n 073-65836-00
IB Module
RIF Module
KLA / TENCOR 2552 data analysis station:
Label model: KLA-2551X, front panel reads "2552"
Power rating: 120VAC, 20A, 50/60Hz
1994 vintage
Components:
INTEL XBASE8TE8F-C PC computer tower
APC BackUPS
Dual monitors
Keyboard
Trackball
KLA / TENCOR 2132-LC power line conditioner:
P/N: 750-653120
Power rating: 9kVA, 416V, 21A, 3-phase, 50/60Hz
Input: 3-phase, 50/60Hz
Output: 3-phase, 208V/120V
1996 vintage
System currently de-installed.
KLA / TENCOR 2132 is a full-featured, automated mask and wafer inspection equipment. It features advanced, high-performance sensors and advanced imaging technology for high-precision, accurate inspections. The system utilizes bright lines, bright defects, and dark defects imaging sensors with regions of interest, improved defect sorting and classifying, and high-speed automated defect review and defect disposition. The unit provides unsurpassed defect identification and accurate defect disposition for up to 60 wafers per hour. It is a non-contact, non-destructive machine, which ensures wafer-to-substrate integrity throughout the inspection process. With its sophisticated sensor technology, the tool is capable of analyzing a variety of substrates, including silicon, photoresist, glass and ceramics, with a size up to 300mm. The advanced imaging technology of the asset incorporates a variety of imaging modes, enabling the inspection of any grade of semiconductor wafer. High-resolution images of the wafer surface are captured through a variety of lenses and optical presets, enabling a comprehensive overview of the wafer quickly and easily. Three types of imaging modes are available for task-specific inspections: high magnification images, planar images, 3D images. The model also offers improved defect sorting and classifying capabilities. By combining bright line, bright defect, and dark defect images with light from different angles, the equipment can characterize defects with a high degree of accuracy. Defects are classified automatically in real-time and sorted into groups based on the severity of their nature. With the advanced 3D defect analysis module, a detailed 3D map of wafer surface defects can be created. KLA 2132 is an invaluable tool for detecting and disposing of defects with increased precision and accuracy. With its robust features, it helps to boost yield and reduce wafer scrap for a variety of wafer inspection needs.
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