Used KLA / TENCOR 2132 #192495 for sale

KLA / TENCOR 2132
ID: 192495
Brightfield defect wafer inspection system.
KLA / TENCOR 2132 is a mask and wafer inspection equipment designed for use in semiconductor fabrication. It provides general defect inspection, challenging automated inspection (CAI) of complex defect types, as well as review capabilities for ultimate defect confirmation. KLA 2132 offers an optical inspection system with 6-inch (150 mm) inspection capability and quick changeover between multiple wafer sizes. It is capable of delivering 100 μm field of view (FOV) at a resolution of approximately 0.2 μm, meaning it can detect even nanometer scale defects with accuracy and precision. The unit also has advanced defect detection algorithms that can effectively identify both particle and optical defect types, like bridge, scratches, cracks, particles, pinholes, among others. The machine uses a proprietary optical scan architecture to acquire and process images quickly and accurately. This provides a depth of field more than sufficient to inspect a wide range of defect types. The images are then compared to reference images to check for defect-related variations. Additionally, TENCOR 2132 includes defect inspection functions such as defect classification, automatic defect detection, defect analysis, defect review, and defect disposition. The tool includes a user-friendly control software that provides the user with clear, detailed results of their inspections. It also has customized "best-in-class" tools for enhanced image visualization and analysis. The interface allows the operator to easily specify parameters, view results, and quickly refine analysis. 2132 is an extremely versatile and reliable tool for inspecting surfaces for potential defects. Its advanced algorithms and optics asset allow it to detect nanoscale defects with accuracy and precision while providing the user with clear, easy to comprehend results. The model is an ideal solution for any manufacturer in need of high-level inspection and defect analysis.
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