Used KLA / TENCOR 2132 #293586850 for sale

KLA / TENCOR 2132 is a mask & wafer inspection equipment designed for maximum detection capability, large-area coverage and increased throughput. The system utilizes advanced optical detection technologies (Coherent Back Scatter and UV) for simultaneous imaging of different surface layers of the mask & wafer. It also includes roundness instruments, wafer transport modules and multiple resolution measurement autosamplers. The Coherent Back Scatter (CBS) is suitable for quick and accurate inspection of both mask and wafer patterns and is used as a verification tool for inspection times as short as 5 sec/sheet. The UV unit includes a UV lamp and a UV light source, providing high sensitivity to any type of defects, even below the diffractive margin. The roundness instruments encompass multiple 4-axis microfocus accelerometers that measure the circularity of the wafer with nanometer resolution at high speeds. The wafer transport module transfers the wafer from the inspection area to the autosampler. The autosampler is designed to enable accurate inspection of randomly distributed very small structures on the wafer surface, allowing alignment and measurement of structures with sizes down to 150nm. KLA 2132 is a cost-effective and reliable mask & wafer inspection machine, suitable for the automated characterization of wafer etched patterns and defects. The tool is compatible with die-by-die inspection and multiple morphology analysis, and its high-end camera provides real-time imaging of complex shapes and patterns. The device is equipped with advanced pattern matching algorithms, as well as comprehensive fault coverage capabilities and feature-based test analysis. Overall, TENCOR 2132 is a versatile, sophisticated and user-friendly asset comprised of advanced technologies and specialized software applications. Its powerful filter and tolerance measurement algorithms are capable of detecting tiny defects during any production process, confirming the precise quality and functionality of the wafer or mask.