Used KLA / TENCOR 2132 #293595763 for sale

KLA / TENCOR 2132
ID: 293595763
Wafer Size: 6"-8"
Vintage: 1995
Wafer inspection system, 6"-8" 1995 vintage.
KLA / TENCOR 2132 is a fully-automated mask and wafer inspection equipment designed to meet the extreme accuracy and precision needed in production line environments. With its high-resolution camera, advanced image processing and automated 3D measurement functions, KLA 2132 provides an efficient and reliable solution for a wide range of inspection tasks. The system is capable of measuring a variety of defect characteristics, including defects with shapes, sizes, and orientations that can't be detected by traditional approaches. It includes intelligent defect detection capabilities and classification, allowing for rapid case to case comparisons. Its features include integrated defect inspection, advanced wafer resolution, thickness measurements, and multi-layer inspection. The 3D measurement capabilities allow it to detect height variations on both the mask and wafer, allowing for accurate measurements even on curved surfaces. The unit is highly configurable and scalable, allowing it to accommodate numerous user requirements. Additionally, it can be programmed with a number of custom workflows, allowing users to quickly and easily adjust parameters for specific inspections. Its intuitive graphical user interface facilitates the setup of multiple languages and is configured to enable measurement data to be shared in a variety of formats. TENCOR 2132 utilizes advanced image processing techniques such as interferometry, photoresist analyses, and metrology imaging to provide extremely accurate and detailed inspection results. Its automatic vision machine uses machine learning and image recognition technology to detect and recognize defects quickly and easily, improving accuracy and decreasing time spent on inspections. The tool is compatible with a wide range of mask and wafer sizes, making it ideal for semiconductor production lines. It is also designed to meet a variety of production requirements, ensuring its compatibility with advanced processes. This ensures that the asset always remains capable of supporting the most recent production technologies. In summary, 2132 is a highly advanced and advanced mask and wafer inspection model designed to increase accuracy and precision, improve detection times and yields, and lower production costs. With a wide range of configuration options, it is perfect for all production lines and semiconductor manufacturers.
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