Used KLA / TENCOR 2132 #293628427 for sale

KLA / TENCOR 2132 is a mask and wafer inspection equipment designed to detect defects in circuit patterns on photomasks and wafers used in microelectronic device fabrication. It provides high-speed pattern inspection with a three-dimensional level of accuracy for the effective manufacturing of high-density, high-resolution integrated circuits. The system features advanced pattern recognition and material identification technologies that enable highly detailed analysis of circuit patterns with an emphasis on defect detection. Inspection of mask and wafer patterns is prefaced by the creation of a parameterized image that is stored in the on-board memory of KLA 2132. The parameterized image is used to compare the mask and wafer patterns with the reference image used to define the pattern. This comparison process allows the unit to locate and identify features in the pattern. Detected features are then analyzed to determine whether they are in line with the reference pattern and the predefined parameters. TENCOR 2132 utilizes a proprietary high accuracy algorithm for detecting anomalies in patterns. This algorithm inspects for surface topography, edge anomalies, pattern line placement, critical feature detections, and other pattern parameters. Upon identifying a defect, the machine can specify its size, location, type, and other related information. In addition, the tool can integrate its inspection results with an existing die- or design-to-die database to enable on-the-spot failure analysis. 2132 also features an automated corrective particle inspection feature which automatically removes detected particles or contamination from the mask or wafer patterns by applying a pattern-based correction algorithm. Finally, the asset is specifically designed for 24-hour operation due to its easily accessible tooling and parts, allowing for regular maintenance and alignment automation. KLA / TENCOR 2132 is an advanced model designed to provide critical inspection and failure analysis solutions designed to minimize production costs and maximize yield in the fabrication of high-density, high-resolution integrated circuits. This equipment integrates highly advanced pattern recognition and material identification technologies that enable precise pattern analysis and defect detection in demanding industrial environments. With its innovative solutions, KLA 2132 provides a powerful package for ensuring the high quality of microelectronic device fabrication.