Used KLA / TENCOR 2132 #293800562 for sale

KLA / TENCOR 2132 is a mask and wafer inspection equipment for semiconductor device non-volatile memory manufacturing. It is designed to help reduce scrap and increase yield. Its key features include the ability to detect defects on a wide range of device sizes, with a maximum die size of 645mm2. It also features advanced defect detection algorithms that can detect a wide range of defects, from sub-pixel defects to full-die defects. KLA 2132 includes a state-of-the-art mask-inspection capability for wafer-level packages and other structures, such as copper pillar bumps and solder bumps, using both optical and e-beam techniques. It also includes automated measurement and defect detection capabilities to ensure accuracy and repeatability. In addition, it has an advanced algorithm engine which process the 3D data of the mask replicas, allowing full scans at high speed. The result is quicker, higher accuracy inspections. TENCOR 2132 also features a "multi-system" operation, allowing concurrent wafer and mask operations with one unit. This allows for efficient workflow, and reduces downtime by up to two-thirds when performing multiple operations. The machine includes multiple mask aligners, so that different mask types can be inspected concurrently. To ensure reliability and accuracy, the tool includes an integrated vision processing engine developed under advanced lithography principles. This vision toolset allows for the rapid and accurate detection of defects. In addition, the asset includes advanced scanning technologies which enable improved defect detection in areas that are normally difficult to inspect, such as blind and buried features. For easy setup and operation, 2132 includes an intuitive GUI that allows for rapid and easy setup. There are dedicated functions for making quick adjustments for wafer size, magnification, image size and area of inspection. The interface also allows for mapping of patterns to particular types of operations, allowing for fast and efficient operation. Overall, KLA / TENCOR 2132 is an advanced mask and wafer inspection model that can significantly reduce scrap and improve yield. With its advanced vision processing capabilities, it can detect a wide range of defects in a variety of structures. It also includes intuitive setup operations and improved scanning techniques to improve accuracy and yield. The equipment is an excellent choice for device manufacturers looking to lower costs and increase yield.