Used KLA / TENCOR 2132 #293815221 for sale

KLA / TENCOR 2132 mask and wafer inspection equipment is a highly accurate, high-speed automated optical inspection tool for microelectronic device manufacturing. It is an integrated machine that employs a state of the art optical detection system, combined with advanced optics and image analysis software, to quickly and effectively examine frontside and backside mask and wafer surfaces. The unit is designed to detect both critical and non-critical defects, ranging from 0.07μm to 45μm in size. KLA 2132 utilizes a high resolution 5 megapixel linear array CCD camera machine that captures images at a rate of 20,000 images per second, providing both highly detailed imaging and rapid acquisition speed. Its three FlashMax high-dynamic-range optical conditioning systems allow backside imaging of etched or non-etched wafers, including unprotected backside of devices, which other inspection systems often cannot do. The tool is capable of inspecting photomask features, using either the direct viewing of high-contrast features on standard masks or through the use of low-dose imaging. Additionally, TENCOR 2132 is suitable for inspecting the etch and print process layers on both front and backside wafer surfaces. Sophisticated image analysis algorithms are used to quickly and accurately identify defects, evaluate process performance, and track changes in wafer performance over time. The integrated hardware and software available with 2132 make it a superior mask and wafer inspection tool. Not only can it detect a wide range of defects, but it is also incredibly reliable and fast. Delivering accurate imaging, improving productivity, and reducing inspection time, KLA / TENCOR 2132 offers an ideal solution for the detection and evaluation of mask and wafer defects.