Used KLA / TENCOR 2132 #293820147 for sale

KLA / TENCOR 2132 Mask and Wafer Inspection Equipment is a state-of-the-art system designed to provide rapid, reliable, and cost-effective optical inspection of both masks and wafers. Combining the advanced optics of KLA surface inspection systems with the industry's leading automatic defect classification and characterization capabilities, KLA 2132 Mask and Wafer Inspection Unit is an essential tool for semiconductor fabrication facilities seeking greater accuracy and production efficiency. TENCOR 2132 Mask and Wafer Inspection Machine provides comprehensive 3-D imaging microscopy for surface topography, optical failure analysis and defect detection. Using quadrant based image acquisition and analysis (QBIA), the tool can rapidly and accurately inspect large areas for flaws, contaminants and defects on either the masks or the actual fabrication wafers. The asset delivers clear images even with objects as small as 4 µm, making it ideal for the detection of particles, particles, and other defects that could lead to model failures. In addition to providing advanced optical inspection capabilities, the equipment also offers advanced defect classification and characterization. 2132's embedded software has been designed to quickly and accurately classify defects based on factors such as shape and size. This allows the system to pinpoint and isolate individual defects, speeding the characterization process and allowing for quick diagnosis and corrective action. KLA / TENCOR 2132 Mask and Wafer Inspection Unit also features a built-in auto-calibration feature that allows the machine to be quickly setup and ready to use. This helps to save time, effort, and frustration when setting up the tool for use on different tasks. KLA 2132 Mask and Wafer Inspection Asset has been designed to comply with SEMI standards for optical inspection systems and is backed by TENCOR industry-leading warranty. This state-of-the-art inspection model is the perfect tool for ensuring optimum production efficiency and accuracy for any semiconductor fabrication facility.