Used KLA / TENCOR 2132 #293824937 for sale

KLA / TENCOR 2132 is an automated mask and wafer inspection equipment designed to provide early detection of yield-limiting defects for advanced semiconductor manufacturing. The system utilizes a unique laser-induced optical microscope (LIM) to inspect the front side of a die or reticle from top to bottom, layer by layer. The LIM provides the highest resolution available, allowing the detection of sub-micron defects or shapes on the final mask layer or wafer layer of that die or reticle. It simultaneously inspects for lithography-related defects, pore defects, line bridging, and other critical defects. The unit is equipped with an integrated camera that automatically determines which layer to inspect, based on the layer number and type of defects detected. It can detect defects as small as 0.1um in both CD and Pitch, and it can even detect CD hairline defects. The machine is designed to inspect up to four wafers at a time, ensuring quick turnaround times and relatively low cost per wafer. Besides the LIM, KLA 2132 also incorporates other technologies such as KLA CMM scanner, which is used to accurately measure the dimensions of the wafers and reticles. This helps to ensure that no errors have been made during the mask or wafer fabrication process. The tool is also equipped with an Auto-Recipe Generation tool, which helps to automate the inspection process by creating custom recipes for each wafer, depending on the application and technology. The asset also includes advanced software tools such as statistical process control and advanced defect classification. This allows users to quickly examine the defect levels and their correlation with process variables for effective improvement of the overall process control and yield. Additionally, the model includes real-time reporting and analysis capabilities, allowing for quick adjustments or optimization of the process variables during the inspection. Finally, TENCOR 2132 equipment is certified for YieldRCA-3 operation, which allows users to quickly and accurately diagnose any defects found during the inspection. This makes the system a powerful tool for any semiconductor fabrication process - especially for identifying the root cause of yield-limiting defects.