Used KLA / TENCOR 2132 #9167971 for sale

KLA / TENCOR 2132 Mask & Wafer Inspection equipment is an automated inspection system used to identify and assess various features embedded within complex geometries on microchip wafers and masks. This widely adopted unit is used in the semiconductor industry to help ensure the highest level of quality control, accuracy and productivity. The machine is built on the advanced Tencorcore Laser Scanning Technology (TLST) platform, which features a unique combination of four optical configurations: opitcal projection (OP), backside illuminated (BI), focusing-split (FS) and through-silicon-via (TSV). All four of these configurations provide superior image resolution and image depth, allowing for the analysis of target features from various angles within the same imaging tool. This is especially important for applications such as failure analysis, process step verification, 2D/3D lithography analysis, yield monitoring and many more. Built on the TLST platform, KLA 2132 asset is a precision engineering tool used for advanced failure analysis and process monitoring. It offers advanced image capture and analysis capabilities with real-time throughput and flexible model configuration. Every optical configuration includes slicing wafer surface features into multiple height data sets, which helps measure the accuracy of a target layer as well as assess surrounding features. This way, users can quickly and accurately identify any errors occurring during the manufacturing process. TENCOR 2132 also features advanced semiconductor and advanced electronics inspection abilities. Its intuitive user interface provides easy access to multiple features, including intuitive and powerful inspection traceability, robust data analysis, real-time feedback and a comprehensive defect review tool. This enables advanced process control and page to page yield assurances. In summary, 2132 is an advanced mask & wafer inspection equipment designed to help the semiconductor industry reaching higher levels of accuracy and quality control. Its advanced image capture and analysis options, combined with real-time throughput and flexible system configuration, makes it a perfect tool for advanced failure analysis and process monitoring.