Used KLA / TENCOR 2132 #9181746 for sale

KLA / TENCOR 2132 is a high-end mask and wafer inspection equipment designed to quickly and accurately inspect semiconductor mask and wafer patterning defects through optical recognition and image analysis. It is capable of detecting various types of pattern defects, from inaccuracies in line widths, patterns, and combinations, to the presence of foreign matter, such as particles, residues, and scratches. This system utilizes an advanced lighting unit and an image recognition technology developed by KLA. The illumination machine uses a combination of low-level and high-intensity light sources for the image capture, along with additional illumination sources that enable the automated focus mechanism to perfectly capture sharp images despite the presence of power variation in the substrates. The image analysis and identification software is also highly sophisticated. A combination of algorithms and analysis techniques, such as edge detection, intensity measurements, and filter operations are used to identify defects with a high degree of accuracy. This tool can identify defects from the entire wafer or mask map down to single-pixel resolution. It is also able to accurately detect even slight changes in the patterned areas. The software also features a suite of tools for visualizing, analyzing, and reporting the inspection results. This allows users to quickly and easily share their findings with other members of the semiconductor manufacturing process. The asset also includes a wide range of advanced parameters that can be customized according to user requirements. KLA 2132 is a highly reliable, versatile mask and wafer inspection model. It provides accurate and reliable results while eliminating the need for manual processes. The advanced detection and analysis capabilities, coupled with the powerful visualization and reporting capabilities, make it an ideal solution for semiconductor manufacturers seeking to identify and eliminate patterning defects in their products.