Used KLA / TENCOR 2132 #9277331 for sale

KLA / TENCOR 2132 mask and wafer inspection equipment is a fully-automated imaging and inspection device used to detect defects with high accuracy and resolution on substrates as thin as 200 nanometres (nm) thick. The system combines automated optical imaging, illumination, and inspection of up to 60 test sites in parallel. KLA 2132 uses high-resolution pixel sensor technology to capture images of the mask/wafer surface and compare these to a pre-programmed set of defect parameters. TENCOR 2132 also has advanced AASIS-TACT (Advanced Automated Structural Inspection Unit - Ternary Aerochip Trias) technology that examines microscopic features with high sensitivity. AASIS-TACT has been specifically designed to inspect high-pin-count devices with high accuracy. It automatically isolates, measures and characterizes defects on the substrate using three-dimensional waveform analysis. This gives 2132 an automated way of scanning and measuring criteria such as defect size, shape, surface area and edge slope during inspection. The machine is capable of fast throughput, providing up to 8 wafers per hour, and is equipped with a built-in BGA view point detection tool. This allows for failure analysis in the shortest possible time. KLA / TENCOR 2132 also has an Auto-Match capability for fast measurement of masks with similar images. The asset is highly automated and user-friendly, requiring minimal operator input. It is backed by comprehensive technical support and has the reliability and flexibility to meet the ever changing demands of the industry. KLA 2132 mask and wafer inspection model offers high performance, volatility and accuracy, in a cost-effective and user-friendly package, making it an ideal solution for automated imaging and defect analysis.