Used KLA / TENCOR 2133 #138914 for sale

KLA / TENCOR 2133 is a mask and wafer inspection equipment designed for high speed and high throughput of semiconductor devices. The system utilizes advanced image acquisition and acquisition processing technology to provide fast and accurate defect inspection. The unit works by detecting small changes in the features of the wafer and mask layout. KLA 2133 uses multiple high speed cameras for imaging and scanning of the layout layers. The cameras enable rapid capture and analysis of the individual layers identified in the layout. The captured images are then processed by algorithms to identify and detect defects in the features of the wafer and mask layout. This is done by detecting very small variations in the pattern of the layout, such as shading or diffraction patterns. The machine includes hardware components such as the detectors, cameras, and optics. The detectors capture the multiple layout layers and the cameras capture the data. The optics focus and align the light onto the material in the tool. The optical components in the asset allow the camera to accurately capture and analyze the data. The software components in the model include image analysis algorithms and vision tools. The algorithms are designed to detect very small changes in the pattern of the layout and also identify the type of defect present. The vision tools allow multiple layers of information to be put together. This helps to produce a complete picture of the feature defects in the layout. TENCOR 2133 offers several advantages for mask and wafer inspection. The equipment is reliable and accurate, can detect the smallest defects, and can work at very fast speeds. The system is also able to inspect multiple layers and process data quickly. Furthermore, the unit is cost effective and offers an easy to use user interface. All of these advantages make 2133 an excellent choice for mask and wafer inspection applications.