Used KLA / TENCOR 2133 #9395745 for sale

KLA / TENCOR 2133 mask and wafer inspection solution is an advanced tools that is capable of producing high resolution images and measurement data for inspecting complex patterns for semiconductor wafers. This equipment provides an increased sensitivity to extremely small defects, and provides multi-wavelength imaging for crisp, clear images. Furthermore, the state-of-the-art vision algorithms provide rapid inspection times and excellent flagging accuracy. KLA 2133 mask and wafer inspection system offers a number of features. Firstly, the unit is designed to handle different substrate thicknesses, including those below 5μm, as well as a range of line pitches. It also provides supreme uniformity of sample illumination at 100 mg/cm2 resolution at the wafer scale, and 10 μm at a single die. Using an ultra-fast lens with symmetric aberration corrections, the machine is able to perform fast, accurate, and repeatable inspection. Furthermore, with a range of optical options including multiple wavelengths and polarized illumination, together with an embedded scatterometry tool, customers have more freedom of choice when designing their product. TENCOR 2133 mask and wafer inspection asset comes with a user-friendly software interface which expedites setup time and eases the construction of complex patterns. Using the Defect LiberationTM technology, users can differentiate between up to 160 patterns automatically, thereby improving yield. The model is further enhanced with the Data ExplorerTM inspection evaluation format, which allows users to quickly explore their inspection results. Additionally, the software includes reporting functions, enabling engineers to gain insights into source, type, and location of defects on the patterns, providing better control and RIB analysis. 2133 mask and wafer inspection equipment is ideally suited for IC, MEMS, and LED manufacturers. The system is fully compatible with the Modular Evaluation Platform (MEP), allowing customers to easily integrate multiple measurement systems to provide a comprehensive characterization solution. An innovative marking and merge technique increases throughput, while a new color layer automation and marker detection unit increase overall accuracy. By combining fast automated matching and precise matching technology, customers can reduce inspection time and false fails rates. In conclusion, KLA / TENCOR 2133 mask and wafer inspection solution is an advanced machine designed to produce highly reliable and accurate inspection results. The tool provides user-friendly interfaces which allow engineers to effectively manage their operations. With a range of features and optical options, the asset is ideal for IC, MEMS, and LED manufacturers wishing to upgrade their mask and wafer inspection capabilities.